The CMOS (complementary metal oxide semiconductor) technology is the base
for Toshibas custom LSI (large scale integration) products. Toshiba is
continuously investing in fabrication capacity and advanced process
development.
Toshiba
CMOS
Technology Roadmap for ASIC
Toshiba has already started process development for the technologies of geometries smaller than 65nm. However, production of mature technologies, is still available for design starts. Toshiba has no plans to discontinue production, (for example, 1.0um technology, introduced in 1986 is still in production.)
Note: The CMOS Technology roadmap is an interactive element. Please select the technology by moving your cursor over the image and you will get key feature / target applications listed in a text-box.

As a result of this long term strategy, a variety of technologies ranging from mature 0.6um down to advanced 65nm transistor channel length technologies are available for design start today (2006). Customers can select the one that best fits their specific product requirements in terms of cost
and performance, voltage/power constraints and cell/block availability. Mature technologies offer high voltage options (18V/48V), later technologies offer several process options for low power, high speed, low leakage current and precise analogue functions. All technologies support a wide range of different I/O (input/output) voltages.
More information about different technologies are available in our product flyer:
If you require further information please
contact the ASIC &
Foundry team.
Universal Array ()
Universal Array is a new system-on-chip (SoC)
design platform that significantly reduces the development time
for SoC devices. By applying Universal Array
, Toshiba has cut the turn-around-time for production of
engineering samples for 130nm and 90nm process technology
significantly. Further details could be found
here.
Toshiba CMOS Technology for Foundry
All Toshiba CMOS technologies are available for foundry
business. Mature technology production is at Iwate plant (0.6um
... 0.35um on 6 inch wafer). While mainstream and advanced
technology production is at Oita plant (0.25um ... 0.13um on 8
inch wafer and from 90nm onwards on 12 inch wafer).
Further production service details can be
found here.
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